Partial crystallization of silicon by high intensity laser irradiation

Autor: Azuma, Hirozumi, Sagisaka, Akito, Daido, Hiroyuki, Ito, Isao, Kadoura, Hiroaki, Kamiya, Nobuo, Ito, Tadashi, Nishimura, Akihiko, Ma, Jinglong, Mori, Michiaki, Orimo, Satoshi, Ogura, Koichi
Zdroj: In Applied Surface Science 2009 255(24):9783-9786
Databáze: ScienceDirect