Praseodymium silicide formation at the Pr 2O 3/Si interface

Autor: Watahiki, Tatsuro , Tinkham, Brad P., Jenichen, Bernd, Shayduk, Roman, Braun, Wolfgang, Ploog, Klaus H.
Zdroj: In Applied Surface Science 2008 255(3):758-760
Databáze: ScienceDirect