Charge neutralization using secondary electron shower for shave-off depth profiling by focused ion beam secondary ion mass spectrometry
| Autor: | Ishizaki, Y., Yamamoto, T., Fujii, M., Owari, M., Nojima, M., Nihei, Y. |
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| Zdroj: | In Applied Surface Science 2008 255(4):1351-1353 |
| Databáze: | ScienceDirect |
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