Chemical, energetic, and geometric heterogeneity of device-quality (1 0 0) surfaces of single crystalline silicon after HF aq etching

Autor: Cerofolini, G.F., Giussani, A., Modelli, A., Mascolo, D., Ruggiero, D., Narducci, D., Romano, E.
Zdroj: In Applied Surface Science 2008 254(18):5781-5790
Databáze: ScienceDirect