Structural and surface properties of Si 1− xGe x thin films obtained by reduced pressure CVD
| Autor: | Teixeira, R.C., Doi, I., Diniz, J.A., Swart, J.W., Zakia, M.B.P. |
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| Zdroj: | In Applied Surface Science 2007 254(1):207-212 |
| Databáze: | ScienceDirect |
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