Effect of high energy ion irradiation on silicon substrate in a pulsed plasma device
| Autor: | Bhuyan, H., Favre, M., Valderrama, E., Avaria, G., Guzman, F., Chuaqui, H., Mitchell, I., Wyndham, E., Saavedra, R., Paulraj, M. |
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| Zdroj: | In Applied Surface Science 2007 254(1):197-200 |
| Databáze: | ScienceDirect |
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