Formation of silicon nanodots from dysprosium-doped amorphous SiC xO y films grown by hot-filament assisted chemical vapor deposition of CH 3SiH 3 and Dy(DPM) 3 gas jets

Autor: Ikoma, Yoshifumi, Masaki, Takayoshi, Kawai, Shinji, Motooka, Teruaki
Zdroj: In Applied Surface Science 2007 253(21):8657-8660
Databáze: ScienceDirect