Depth control of a silicon structure fabricated by 100 q keV Ar ion beam lithography
| Autor: | Kawasegi, Noritaka, Morita, Noboru, Yamada, Shigeru, Takano, Noboru, Oyama, Tatsuo, Momota, Sadao, Taniguchi, Jun, Miyamoto, Iwao |
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| Zdroj: | In Applied Surface Science 2007 253(6):3284-3291 |
| Databáze: | ScienceDirect |
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