Round-robin study of arsenic implant dose measurement in silicon by SIMS
| Autor: | Simons, D., Kim, K., Benbalagh, R., Bennett, J., Chew, A., Gehre, D., Hasegawa, T., Hitzman, C., Ko, J., Lindstrom, R., MacDonald, B., Magee, C., Montgomery, N., Peres, P., Ronsheim, P., Yoshikawa, S., Schuhmacher, M., Stockwell, W., Sykes, D., Tomita, M., Toujou, F., Won, J. |
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| Zdroj: | In Applied Surface Science 2006 252(19):7232-7235 |
| Databáze: | ScienceDirect |
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Full Text from ScienceDirect