Phosphorous degassing from poly silicon under thermal exposure: A ToF-SIMS depth profile investigation
| Autor: | Alberici, S.G., Piagge, R. |
|---|---|
| Zdroj: | In Applied Surface Science 2006 252(19):7272-7274 |
| Databáze: | ScienceDirect |
| Externí odkaz: |
|
| Autor: | Alberici, S.G., Piagge, R. |
|---|---|
| Zdroj: | In Applied Surface Science 2006 252(19):7272-7274 |
| Databáze: | ScienceDirect |
| Externí odkaz: |
|
Full Text from ScienceDirect