Dissolution behaviour of the barrier layer of porous oxide films on aluminum formed in phosphoric acid studied by a re-anodizing technique
| Autor: | Vrublevsky, I., Parkoun, V., Schreckenbach, J., Goedel, Werner A. |
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| Zdroj: | In Applied Surface Science 2006 252(14):5100-5108 |
| Databáze: | ScienceDirect |
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