Elemental depth profiling of a-Si 1− xGe x:H films by elastic recoil detection analysis and secondary ion mass spectrometry
| Autor: | Mikami, A., Takagawa, T., Nishio, K., Ogawa, H., Okazawa, T., Kido, Y. |
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| Zdroj: | In Applied Surface Science 2006 252(14):5124-5130 |
| Databáze: | ScienceDirect |
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