Synthesis and characterization of superhard Ti–Si–N films obtained in an inductively coupled plasma enhanced chemical vapor deposition (ICP-CVD) with magnetic confinement
| Autor: | Zhao, Hong-yu, Fan, Qiu-lin, Song, Li-xin, Zhang, Tao, Shi, Er-wei, Hu, Xing-fang |
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| Zdroj: | In Applied Surface Science 2006 252(8):3065-3072 |
| Databáze: | ScienceDirect |
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