Pulsed laser deposition of HfO 2 and Pr xO y high-k films on Si(100)

Autor: Ratzke, M. *, Wolfframm, D., Kappa, M., Kouteva-Arguirova, S., Reif, J.
Zdroj: In Applied Surface Science 2005 247(1):128-133
Databáze: ScienceDirect