Differences of Stark shift behavior in Si/SiO2 quantum wells and quantum dots

Autor: de Sousa, J.S. a, Freire, J.A.K. a, Freire, V.N. a, Silva, E.F. da, Jr. b, *
Zdroj: In Applied Surface Science 15 October 2004 237(1-4):544-548
Databáze: ScienceDirect