Differences of Stark shift behavior in Si/SiO2 quantum wells and quantum dots
Autor: | de Sousa, J.S. a, Freire, J.A.K. a, Freire, V.N. a, Silva, E.F. da, Jr. b, * |
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Zdroj: | In Applied Surface Science 15 October 2004 237(1-4):544-548 |
Databáze: | ScienceDirect |
Externí odkaz: |