Chemical mechanical polishing (CMP) anisotropy in sapphire
| Autor: | Zhu, Honglin, Tessaroto, Luiz A., Sabia, Robert, Greenhut, Victor A., Smith, Maynard, Niesz, Dale E. |
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| Zdroj: | In Applied Surface Science 15 September 2004 236(1-4):120-130 |
| Databáze: | ScienceDirect |
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