Depth profiling of ZrO 2/SiO 2/Si stacks—a TOF-SIMS and computer simulation study

Autor: Ignatova, V.A., Conard, T., Möller, W., Vandervorst, W., Gijbels, R.
Zdroj: In Applied Surface Science 2004 231:603-608
Databáze: ScienceDirect