Depth profiling of ZrO 2/SiO 2/Si stacks—a TOF-SIMS and computer simulation study
Autor: | Ignatova, V.A., Conard, T., Möller, W., Vandervorst, W., Gijbels, R. |
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Zdroj: | In Applied Surface Science 2004 231:603-608 |
Databáze: | ScienceDirect |
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