High resolution depth profiling of thin STO in high- k oxide material
| Autor: | Ehrke, U., Sears, A., Alff, L., Reisinger, D. |
|---|---|
| Zdroj: | In Applied Surface Science 2004 231:598-602 |
| Databáze: | ScienceDirect |
| Externí odkaz: |
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| Autor: | Ehrke, U., Sears, A., Alff, L., Reisinger, D. |
|---|---|
| Zdroj: | In Applied Surface Science 2004 231:598-602 |
| Databáze: | ScienceDirect |
| Externí odkaz: |
|
Full Text from ScienceDirect