Low-temperature silicon homoepitaxial growth by pulsed magnetron sputtering
| Autor: | Reinig, P., Fenske, F., Selle, B., Bohne, W., Röhrich, J., Sieber, I., Fuhs, W. |
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| Zdroj: | In Applied Surface Science 15 April 2004 227(1-4):114-121 |
| Databáze: | ScienceDirect |
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