Influence of substrate temperature on titanium oxynitride thin films prepared by reactive sputtering

Autor: Chappé, J.-M., Martin, N., Pierson, J.F., Terwagne, G., Lintymer, J., Gavoille, J., Takadoum, J.
Zdroj: In Applied Surface Science 2004 225(1):29-38
Databáze: ScienceDirect