X-ray photoelectron spectroscopy of polycrystalline AlN surface exposed to the reactive environment of XeF 2
Autor: | Watanabe, Morimichi, Mori, Yukimasa, Ishikawa, Takahiro, Iida, Takashi, Akiyama, Keijiro, Sawabe, Kyoichi, Shobatake, Kosuke |
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Zdroj: | In Applied Surface Science 2003 217(1):82-87 |
Databáze: | ScienceDirect |
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