X-ray photoelectron spectroscopy of polycrystalline AlN surface exposed to the reactive environment of XeF 2

Autor: Watanabe, Morimichi, Mori, Yukimasa, Ishikawa, Takahiro, Iida, Takashi, Akiyama, Keijiro, Sawabe, Kyoichi, Shobatake, Kosuke
Zdroj: In Applied Surface Science 2003 217(1):82-87
Databáze: ScienceDirect