Nucleation and growth of nanocrystalline silicon studied by TEM, XPS and ESR
| Autor: | Sato, Keisuke, Izumi, Tomio, Iwase, Mitsuo, Show, Yoshiyuki, Morisaki, Hiroshi, Yaguchi, Toshie, Kamino, Takeo |
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| Zdroj: | In Applied Surface Science 2003 216(1):376-381 |
| Databáze: | ScienceDirect |
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