SIMS round-robin study of depth profiling of arsenic implants in silicon
| Autor: | Tomita, M., Hasegawa, T., Hashimoto, S., Hayashi, S., Homma, Y., Kakehashi, S., Kazama, Y., Koezuka, K., Kuroki, H., Kusama, K., Li, Z., Miwa, S., Miyaki, S., Okamoto, Y., Okuno, K., Saito, S., Sasaki, S., Shichi, H., Shinohara, H., Toujou, F., Ueki, Y., Yamamoto, Y. |
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| Zdroj: | In Applied Surface Science 2003 203:465-469 |
| Databáze: | ScienceDirect |
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Full Text from ScienceDirect