Electron beam lithography: resolution limits and applications
| Autor: | Vieu, C. *, Carcenac, F., Pépin, A., Chen, Y., Mejias, M., Lebib, A., Manin-Ferlazzo, L., Couraud, L., Launois, H. |
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| Zdroj: | In Applied Surface Science 2000 164(1):111-117 |
| Databáze: | ScienceDirect |
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