CMOS sensors in 90 nm fabricated on high resistivity wafers: Design concept and irradiation results
| Autor: | Rivetti, A., Battaglia, M., Bisello, D., Caselle, M., Chalmet, P., Costa, M., Demaria, N., Giubilato, P., Ikemoto, Y., Kloukinas, K., Mansuy, C., Marchioro, A., Mugnier, H., Pantano, D., Potenza, A., Rousset, J., Silvestrin, L., Wyss, J. |
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| Zdroj: | In Nuclear Inst. and Methods in Physics Research, A 1 December 2013 730:119-123 |
| Databáze: | ScienceDirect |
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