Surface metal contamination on silicon wafers after hydrogen plasma immersion ion implantation
| Autor: | Fan, Zhineng, Zeng, Xuchu, Chu, Paul K *, Chan, Chung, Watanabe, Masaharu |
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| Zdroj: | In Nuclear Inst. and Methods in Physics Research, B 1999 155(1):75-78 |
| Databáze: | ScienceDirect |
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