Raman scattering studies of low energy Ar+ ion implanted monocrystalline silicon for synchrotron applications

Autor: Kumar, N., Volodin, V.A., Goryainov, S.V., Chernyshev, A.K., Kozakov, A.T., Scrjabin, A.A., Chkhalo, N.I., Mikhailenko, M.S., Pestov, A.E., Zorina, M.V.
Zdroj: In Nuclear Inst. and Methods in Physics Research, B 1 January 2023 534:97-102
Databáze: ScienceDirect
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