Peculiarities of latent track etching in SiO2/Si structures irradiated with Ar, Kr and Xe ions
| Autor: | Al’zhanova, A., Dauletbekova, A., Komarov, F., Vlasukova, L., Yuvchenko, V., Akilbekov, A., Zdorovets, M. |
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| Zdroj: | In Nuclear Inst. and Methods in Physics Research, B 1 May 2016 374:121-124 |
| Databáze: | ScienceDirect |
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