Critical process temperatures for resistive InGaAsP/InP heterostructures heavily implanted by Fe or Ga ions
| Autor: | Fekecs, André, Chicoine, Martin, Ilahi, Bouraoui, SpringThorpe, Anthony J., Schiettekatte, François, Morris, Denis, Charette, Paul G., Arès, Richard |
|---|---|
| Zdroj: | In Nuclear Inst. and Methods in Physics Research, B 15 September 2015 359:99-106 |
| Databáze: | ScienceDirect |
| Externí odkaz: |
|
Full Text from ScienceDirect