Effect of helium ion beam treatment on the etching rate of silicon nitride
| Autor: | Petrov, Yu.V., Sharov, T.V., Baraban, A.P., Vyvenko, O.F. |
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| Zdroj: | In Nuclear Inst. and Methods in Physics Research, B 15 April 2015 349:90-95 |
| Databáze: | ScienceDirect |
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