Ultra-thin film and interface analysis of high-k dielectric materials employing Time-Of-Flight Medium Energy Ion Scattering (TOF-MEIS)

Autor: Primetzhofer, D., Dentoni Litta, E., Hallén, A., Linnarsson, M.K., Possnert, G.
Zdroj: In Nuclear Inst. and Methods in Physics Research, B 1 August 2014 332:212-215
Databáze: ScienceDirect