Artificial sub-μm magnetic patterning by He+ ion bombardment through a mask fabricated by Ultraviolet NanoImprint Lithography (UV-NIL)
| Autor: | Schmidt, Christoph, Smolarczyk, Marek, Gomer, Ludmilla, Hillmer, Hartmut, Ehresmann, Arno |
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| Zdroj: | In Nuclear Inst. and Methods in Physics Research, B 1 March 2014 322:59-62 |
| Databáze: | ScienceDirect |
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