Application of stencil masks for ion beam lithographic patterning
| Autor: | Brun, S., Savu, V., Schintke, S., Guibert, E., Keppner, H., Brugger, J., Whitlow, H.J. |
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| Zdroj: | In Nuclear Inst. and Methods in Physics Research, B 1 July 2013 306:292-295 |
| Databáze: | ScienceDirect |
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