Creation of Si nanocrystals from SiO2/Si by He and H ion implantation
| Autor: | Zhang, X.D., Liu, C.L., Li, M.K., Gao, Y.J., Zhang, D.C. |
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| Zdroj: | In Nuclear Inst. and Methods in Physics Research, B 1 April 2012 276:25-29 |
| Databáze: | ScienceDirect |
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