Post deposition annealing of Hf aluminate films on Si investigated by ion backscattering and nuclear reaction analyses
| Autor: | Miotti, L., Pezzi, R.P., Copel, M., Baumvol, I.J.R. |
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| Zdroj: | In Nuclear Inst. and Methods in Physics Research, B April 2008 266(8):1162-1165 |
| Databáze: | ScienceDirect |
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