Dose-rate dependence of radiation-induced interface trap density in silicon bipolar transistors

Autor: Hjalmarson, H.P., Pease, R.L., Hembree, C.E., Van Ginhoven, R.M., Schultz, P.A.
Zdroj: In Nuclear Inst. and Methods in Physics Research, B September 2006 250(1-2):269-273
Databáze: ScienceDirect