Ion beam current dependence of compositions and resistivities on titanium nitride films deposited onto silicon by an ion beam assisted deposition method

Autor: Yokota, Katsuhiro, Kasuya, Tomohiko, Nakamura, Kazuhiro, Ohnishi, Masami, Miyashita, Fumiyoshi
Zdroj: In Nuclear Inst. and Methods in Physics Research, B January 2006 242(1-2):390-392
Databáze: ScienceDirect