Low energy electron induced X-ray emission spectrometry (LEXES) and secondary ion mass spectrometry (SIMS) sensitivity studies to ultra shallow arsenic implants
Autor: | Graoui, H., Conti, G., Hilkene, M., McComb, B., Tjandra, A., Foad, M.A., Kouzminov, D., Hunter, J., Hitzman, C.J., Evans, C.A. |
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Zdroj: | In Nuclear Inst. and Methods in Physics Research, B August 2005 237(1-2):336-340 |
Databáze: | ScienceDirect |
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