Low energy electron induced X-ray emission spectrometry (LEXES) and secondary ion mass spectrometry (SIMS) sensitivity studies to ultra shallow arsenic implants

Autor: Graoui, H., Conti, G., Hilkene, M., McComb, B., Tjandra, A., Foad, M.A., Kouzminov, D., Hunter, J., Hitzman, C.J., Evans, C.A.
Zdroj: In Nuclear Inst. and Methods in Physics Research, B August 2005 237(1-2):336-340
Databáze: ScienceDirect