Effect of Si implantation on the microstructure of silicon nanocrystals and surrounding SiO2 layer
Autor: | Ross, G.G., Smirani, R., Levitcharsky, V., Wang, Y.Q., Veilleux, G., Saint-Jacques, R.G. |
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Zdroj: | In Nuclear Inst. and Methods in Physics Research, B April 2005 230(1-4):198-202 |
Databáze: | ScienceDirect |
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