Effect of Si implantation on the microstructure of silicon nanocrystals and surrounding SiO2 layer

Autor: Ross, G.G., Smirani, R., Levitcharsky, V., Wang, Y.Q., Veilleux, G., Saint-Jacques, R.G.
Zdroj: In Nuclear Inst. and Methods in Physics Research, B April 2005 230(1-4):198-202
Databáze: ScienceDirect