Effects of substrate temperature during implantation on the mechanical properties of ion-implanted silicon
| Autor: | Wang, Q., Ishikawa, H., Ogiso, H., Nakano, S., Akedo, J. |
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| Zdroj: | In Nuclear Inst. and Methods in Physics Research, B 2004 217(4):598-602 |
| Databáze: | ScienceDirect |
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