Compositional analysis of thin SiO xN y:H films by heavy-ion ERDA, standard RBS, EDX and AES: a comparison
Autor: | Bohne, W, Röhrich, J, Schöpke, A, Selle, B, Sieber, I, Fuhs, W, del Prado, Á, San Andrés, E, Mártil, I, González-Dı́az, G |
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Zdroj: | In Nuclear Inst. and Methods in Physics Research, B 2004 217(2):237-245 |
Databáze: | ScienceDirect |
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