Sheath formation and ion flux distribution inside the trench in plasma-based ion implantation

Autor: Ikehata, T., Shioya, K., Araki, T., Sato, N.Y., Mase, H., Yukimura, K.
Zdroj: In Nuclear Inst. and Methods in Physics Research, B 2003 206:772-776
Databáze: ScienceDirect