Sheath formation and ion flux distribution inside the trench in plasma-based ion implantation
Autor: | Ikehata, T., Shioya, K., Araki, T., Sato, N.Y., Mase, H., Yukimura, K. |
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Zdroj: | In Nuclear Inst. and Methods in Physics Research, B 2003 206:772-776 |
Databáze: | ScienceDirect |
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