Sub-micron channeling contrast microscopy on reactive ion etched deep Si microstructures
| Autor: | Teo, E.J., Alkaisi, M, Bettiol, A.A., Osipowicz, T., Van Kan, J., Watt, F., Markwitz, A. |
|---|---|
| Zdroj: | In Nuclear Inst. and Methods in Physics Research, B 2002 190(1):339-344 |
| Databáze: | ScienceDirect |
| Externí odkaz: |
|
Full Text from ScienceDirect