TiN-CVD process optimization for integration with Cu-CVD

Autor: Motte, P *, Proust, M, Torres, J, Gobil, Y, Morand, Y, Palleau, J, Pantel, R, Juhel, M
Zdroj: In Microelectronic Engineering 2000 50(1):369-374
Databáze: ScienceDirect