Scaling of silicon trench etch rates and profiles in plasma etching
| Autor: | Lukichev, V.F., Yunkin, V.A. |
|---|---|
| Zdroj: | In Microelectronic Engineering 1999 46(1):315-318 |
| Databáze: | ScienceDirect |
| Externí odkaz: |
|
| Autor: | Lukichev, V.F., Yunkin, V.A. |
|---|---|
| Zdroj: | In Microelectronic Engineering 1999 46(1):315-318 |
| Databáze: | ScienceDirect |
| Externí odkaz: |
|
Full Text from ScienceDirect