The printing conditions for 0.13μ m features in x-ray lithography using Pohang light Source
| Autor: | Seo, Yongduck, Lee, Jawoong, Choi, Bo Kyoung, Kim, Heesang, Kim, Ohyun |
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| Zdroj: | In Microelectronic Engineering 1998 41:267-270 |
| Databáze: | ScienceDirect |
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Full Text from ScienceDirect