Fabrication of 10-nm Si pillars with self-formed etching masks
| Autor: | Tada, Tetsuya, Kanayama, Toshihiko, Weibel, Pascal, Carroll, Simon J., Seeger, Katrin, Palmer, Richard E. |
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| Zdroj: | In Microelectronic Engineering February 1997 35(1-4):293-296 |
| Databáze: | ScienceDirect |
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Full Text from ScienceDirect