Chemical structure characteristics of flexible low-k SiCOH thin films etched by inductively coupled plasma-reactive ion etching process using FTIR and XPS spectra analysis
| Autor: | Poche, Thomas, Wirth, William, Jang, Seonhee |
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| Zdroj: | In Microelectronic Engineering 15 September 2024 292 |
| Databáze: | ScienceDirect |
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