Using water structuring by ions to address pattern loading in wet HF-based oxide recess etch
| Autor: | Vereecke, Guy, De Coster, Hanne, Dochain, Denis, Nurekeyeva, Kunsulu, Conlan, Shona, Nsimba, Anthony, Wostyn, Kurt, Sanchez, Efrain Altamirano |
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| Zdroj: | In Microelectronic Engineering 15 July 2023 279 |
| Databáze: | ScienceDirect |
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