Development of n-type epitaxial growth on 200 mm 4H-SiC wafers for the next generation of power devices

Autor: Musolino, Mattia, Carria, Egidio, Crippa, Danilo, Preti, Silvio, Azadmand, Mani, Mauceri, Marco, Isacson, Mathias, Calabretta, Michele, Messina, Angelo
Zdroj: In Microelectronic Engineering 1 April 2023 274
Databáze: ScienceDirect